Polymer film deposition with fine pitch openings by stencil printing

Abstract

It is confirmed that stencil printing with a novel developed printable polyimide paste can be used for polymer film deposition on LSI wafers. A thick polyimide film with openings for solder ball bumping can be deposited on all of the LSIs on a wafer by stencil printing at one time. This stencil printing process does not need an expensive lithography process, providing cost-effective wafer-level chip scale packages (WLCSPs). In this study, a novel polyimide paste was tailored to have a higher thixotropy ratio than conventional printable polyimide materials. The novel printable polyimide paste shows that the viscosity ratio of more than 3.5 at the shear rate of 1 to 10 s −1 and that the viscosity increases rapidly after the shear rate is lowered. Fine spaces of 40 μm between 250 μm openings were obtained for 10 μm thick polyimide films on Si wafers. It has been also confirmed that the new paste shows the variation range of 30 μm at the opening size of 385 μm within 100 continuously printed wafers. Even after the new paste was shear-thinned repeatedly, rheological behavior of the new paste was not changed. This robustness leads to higher efficiency of the materials for mass-producing. From the reliability viewpoint of the printed polyimide films, no peelings were observed on plasma-CVD SiN films after the pressure cooker test under the condition of 127 °C and 0.25 MPa with the humidity of 100% for 300 h. The optimal stencil printing process using the novel developed paste will lead to significant cost reduction of a patterned polymer deposition process. Finally, WLCSPs using the stencil printing of the new polyimide paste have been demonstrated for SRAM LSIs on 8-in. wafers.