Abstract
A suspended PMMA quasi-3D PC slab with a hexagonal array of air holes fabricated by using a single-step electron-beam lithography process is shown in the figure (PMMA = polymethylmethacrylate). The extension of the single-step lithography technique to the fabrication of 3D multilayer nanostructures with photonic band gaps in the visible-light region is demonstrated.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
