Abstract
Vacuum characteristic of pure Ti surface modified by such different methods as buffing (BP), chemical (CP) and mechano-chemical (MCP) polishing was compared by using thermal desorption spectroscopy. A characterization of the modified surface was made with scanning electron microscopy to measure electron channelling pattern and profilometry roughness. We report a comparison of thermal desorption aspects in correlating with the modified surface. An outgassing measurement, using the through-put chamber of chemical polished, showed desorbed gasses dominated by not only H2O but also CO(N2) and H2.
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