Polarization and kinetics of optical emission during laser induced periodic surface structure formation on crystalline silicon

Abstract

Polarization and kinetics of secondary optical emission, which occurs during the formation of laser-induced periodic surface structures (LIPSSs) on crystalline silicon by a femtosecond laser beam in air, were analyzed. It was found that the emission lines of ablated Si atoms and formed in plasma SiN molecules are unpolarized, and they decay on the nanosecond scale. The second harmonic generation (SHG) is enhanced by laser-induced surface plasmons, and the SHG polarization basically repeats the polarization of the laser. The results can be used for optical monitoring of LIPSS formation in real time, which is especially important for laser processing of large non-planar surfaces.