Abstract
We have systematically investigated the annealing effect on the structure and composition of the polar surface of $\mathrm{SrTi}{\mathrm{O}}_{3}$ (111) starting with an ex situ chemical etch. The relative surface concentration between Ti and Sr strongly depends on both the annealing temperature and the oxygen processing. There is a critical annealing temperature at which the maximum concentration ratio of Ti to Sr is achieved while still maintaining a $(1\ifmmode\times\else\texttimes\fi{}1)$ surface structure. We demonstrate that with proper processing it is possible to avoid surface reconstruction over a broad temperature range. Our results provide an optimal temperature window for epitaxial film growth.
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