Point defect characterization of GaN and ZnO

Abstract

Point defects are created in bulk ZnO and epitaxial GaN by 1–2 MeV electron irradiation at 300 K, and are studied by temperature-dependent Hall effect, photoluminescence, and deep level transient spectroscopy measurements. The N vacancy is identified as a fairly shallow donor in GaN, whereas defect identifications in ZnO are uncertain at this time. Both materials, but especially ZnO, are quite resistant to displacement damage.