Abstract
Three-dimensional transistors where nanoscale Si films are utilized have attracted great interests because of better short channel immunity. In nanoscale Si, quantum effects on charged carriers become evident and an increase in the electron-phonon scattering rate results in lower thermal conductivity. Therefore, the device designers need to take into account the impact of quantum effects and channel temperature increase on electrical characteristics. In this work, quantum and interface effects which are more evident in nano-structures will be reviewed. Then, experimental evaluation of channel temperature increase (ΔT ch) due to Joule heating and impact of ΔT ch on analog performance of FETs utilizing nanoscale Si film will be shown.
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