Abstract

Direct writing of plasmonic nanostructures is demonstrated by nanoscale-tensile-stress induced patterning through interference crosslinking in a polymer film and by single-pulse interference ablation of a gold film. Nanoscale-tensilestress from the interference crosslinking of polymer films which are exposed to the interference pattern of UV laser beams stretches evaporated gold films and induces pattern transfer from polymer into gold nanostructures. Instead, plasmonic nanostructures can be directly patterned by the interference ablation. Being exposed to the interference pattern of an UV laser pulse, the gold is directly removed within the bright interference fringes, producing periodically arranged plasmonic nanostructures.

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