Abstract
A double-patterning process for scalable, efficient, and deterministic nanoring array fabrication is presented. It enables gaps and features below a size of 20 nm. A writing time of 3 min/cm2 makes this process extremely appealing for scientific and industrial applications. Numerical simulations are in agreement with experimentally measured optical spectra. Therefore, a platform and a design tool for upcoming next generation plasmonic devices like hybrid plasmonic quantum systems are delivered.
Highlights
Plasmonic nanoring fabrication tuned to pitch: Efficient, deterministic, and large scale realization of ultra-small gaps for generation plasmonic devices
Summary
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