Abstract
Surface plasmon interference lithography (SPIL), which can break the diffraction limit to achieve a large area deep subwavelength resolution, has great application potential in the field of micro-nano manufacturing. However, considering the characteristics of the intensity of each order diffraction wave and the rapid attenuation of surface plasmon polariton (SPP) intensity, most of the current work uses the first order diffraction wave of grating to stimulate SPP. According to the matching conditions, the half-pitch resolution of the interference pattern is 1/4 of the grating period, which makes the method still have high requirements for the mask period. In addition, the intimate contact relationship between each layer limits the reuse of the mask, which ultimately limits the development of SPIL. To address these issues, plasmonic interference lithography based on the second-order diffracted wave of grating and hyperbolic multilayer graphene is proposed. Simulation results show that structures with air gaps can obtain interference patterns with a half-pitch resolution of 1/8 of the grating period and 1/6.7 of incident wavelength, as well as maintaining the characteristic of the insensitive to photoresist (PR) thickness.
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