Abstract
Photon avalanche is one of the anti-Stokes upconversion processes characterized by highly nonlinear response of the emission intensity to excitation power density changes. By exceeding the critical pumping power threshold, even minute increase of this power results in a steep increase (by 2-3 orders of magnitude) of the emission intensity. While photon avalanche has been observed in bulk materials since 80-ties, it was reported in thulium-doped nanocrystals only recently, enabling to use them for single excitation beam super-resolution imaging. In current work we explore new perspectives for nanoscale avalanche phenomenon by combining the avalanching materials with plasmonically active metallic nanostructures.
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