Abstract
The microstructure of plasma-nitridedhigh-k ZrO2 thin films is found to continuously transform and larger size nano-crystals are formedduring electron bombardment. Real-time high-resolution transmission electronmicroscopy (HRTEM) studies show that the plasma-nitrided nano-size particles canself-crystallize and regrow, whereas this phenomenon is not observed in amorphousZrO2 without N incorporation. Similar results are observed in plasma-nitridedHfO2 samples and fine-scale polycrystalline nano-arrays are obtained by electronirradiation. Our results show that incorporation of N is crucial for inducingmicrostructural evolution as well as polycrystalline nano-array formation inhigh-k oxide under electron irradiation.
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