Plasma-based nitrogen implantation of chrome-plated steel

Abstract

Plasma-based ion implantation (PBII) of nitrogen into chrome plated-steel is discussed with regard to dimensional homogeneity, depth distribution and the possibility of combining different implantation modes. A stainless holder with 60×10 mm 2 trenches at depths of 60, 40, 20 and 10 mm was made. The chromium-plated steel plates were fixed on the bottom of the trenches and treated by PBII under various conditions. The depth profiles and chemical bonds were measured with X-ray photoelectron spectroscopy (XPS) combined with Ar sputtering. The primary results confirmed that nitrogen PBII could introduce a significant amount of nitrogen into the chrome-plated layers in a shorter time than a conventional beam-line implanter. The implanted nitrogen was observed to combine with chromium. The depth profiles of nitrogen were the same for samples set on holder surfaces both facing and reversed to the RF source, which suggested homogeneous implantation in all directions. The PBII treatment was found to be homogenous for the trenches with an aspect ratio less than 4 without sample manipulation. A rapid elevation in temperature occurred during PBII treatment. Control of the target temperature remains as a future challenge.