Abstract

The plasma-wall interaction in the presence of a monoenergetic electron beam has been studied by taking into account the self-consistency among plasma transport in a collisionless electrostatic sheath, deposited energy flux at the wall and material thermal response for carbon and tungsten as wall materials. The variations of the potential drop across the sheath, ion velocity at the sheath edge, and surface temperature of material as a function of electron beam flux are explored in the presence of the electron emission. It is found that when electron beam does not dominate the sheath, potential drop across the sheath depends strongly on the material properties due to the impact of electron emission while the surface temperature of material shows monotonic variation. In the case of carbon wall, the electron beam may dominate the sheath at a certain electron beam concentration or energy. Under this circumstance, both the potential drop across the sheath and surface temperature of material demonstrate the sharp increasing transition. The development of local hot spot on the plasma facing material is caused by the enhanced ion energy flux instead of the electron beam energy flux. If the electron emission is not taken into account, as a smaller electron beam flux, both the potential drop across the sheath and surface temperature of material display the significant change and then it may be easier to develop for the local hot spot on the plasma facing material.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.