Abstract

Plasma pattern transition in a symmetric hybrid structure cavity device at micrometer scale is researched through microplasma interaction in intervening microchannel between adjacent cavities while manipulating electric field strength. Plasma distribution reconfiguration in central (objective) cavity is observed when sidearm (donor) cavities are ignited. As long as coupling effect occurred by modulating the electric field strength in the sidearm cavities, stable plasma pattern transition in objective cavity is obtained, exhibiting plasma pattern split from one circular spot (initial pattern) to two small circular spots (transited pattern), along with plasma peak emission intensity displacement over 100 μm to its equilibrium position. The shape of transited plasma patterns are depending on the coupling effect from sidearm cavities. The two circular spots unsymmetrically distributed if either donor cavity is ignited, and the ratio of average emission intensity between the two plasma spots is over 30%, however, which is less than 4% if coupling symmetrically occurred. The electrical and optical properties of central microplasma are also modulated, that the breakthrough voltage is decreased by 22% and emission intensity is improved by ∼30%, by means of plasma coupling. The microplasma pattern formation at micrometre scale and manipulation of the electrical properties in microscale cavity implies significant value in the application of plasma transistor and signal processing.

Highlights

  • Over approximately the past decade, a subfield of plasma science, microplasmas, has arisen that is redefining frontiers in the physics of low temperature plasma and its applications

  • This paper reports the microplasma pattern formation and transition in a hybrid structure microcavity device, which are consisted by microcavities and intervening microchannels

  • The two circular spots unsymmetrically distributed if either donor cavity is ignited, and the ratio of average emission intensity between the two plasma spots is over 30%, which is less than 4% if coupling symmetrically occurred

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Summary

INTRODUCTION

Over approximately the past decade, a subfield of plasma science, microplasmas, has arisen that is redefining frontiers in the physics of low temperature plasma and its applications. Variety of concepts and applications are explored in terms of material processing, optical engineering and so forth.[1] Many research groups have made tremendous efforts in studying microplasma as a principle and fundamental subject They have studied generating mechanism, propagation, and electrons/ions behavior in microplasma, in both experimental and theoretical ways. Combined with driving and trigger waveforms comprising a sequence of voltage pulses, the microfabricated thin film structure affords the opportunity to translate, route, attenuate, and re-shape microplasmas at electronic speeds. Is it possible to explore the transport of charge over dielectric surfaces, and of value to microplasma applications in electromagnetics, displays, switches, and signal processing

EXPERIMENTAL DEVICE STRUCTURE AND DATA ACQUISITION
Electrical characteristics
Plasma coupling effect
Discussion
Plasma properties variation induced by plasma coupling effect
CONCLUSIONS
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