Plasma sources for electrons and ion beams

Abstract

Plasma devices are commonly used for the production of ion beams. It has been demonstrated that the multicusp generator can produce very low energy ion beams for ion projection lithography applications. The multicusp source has also found important applications in focused ion beam systems. With its high and uniform plasma density, attempts have been made to extract high brightness electron beams from this type of plasma source, making it also useful for electron beam lithography applications.