Abstract
AbstractThe behavior of microparticles trapped in the curved plasma sheath in the corner of a horizontal rf electrode and a vertical wall is investigated by experiments and simulation. Three types of walls are studied, namely a dielectric wall, a floating conductive wall, and a conductive wall at the same potential as the rf electrode. The particle's equilibrium position provides insight in the acting forces, associated potentials and field structures. Complementary particle‐in‐cell simulations elucidate the structure of the charged‐species densities and electric potential profile throughout the sheath. Thereby special emphasis is placed on how the sheath structure in the corner depends on the wall material (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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