Abstract

AbstractNitric oxide (NO)‐releasing coatings have promising potential for biomedical applications notably in implant safety and wound dressing by promoting healing and reducing bacterial growth. Yet, the production of NO‐films remains difficult through classic approaches. In this study, plasma polymerized NO‐coatings are produced using a helium‐isopentyl nitrite mixture under two power settings and deposited on aluminum samples. Analyses of the plasma phase by mass spectroscopy reveal the presence of nitrosoxy groups (O–N═O) in monomer and quasi‐monomer at low power, and a higher fragmentation rate at high power. Static and no‐static samples are made and analyzed by X‐ray photoelectron spectroscopy showing the presence of these group for both power conditions, with a better retention on the sample's center for the latest.

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