Abstract
A plasma reactor that contains vacuum–arc and magnetron sputtering sources and radio-frequency discharge that generates high-density plasma in the presence of external magnetic field is developed, constructed, and optimized. The reactor can be used for deposition of various functional coatings with ion stimulation. The parameters of the inductive radio-frequency discharge generated in the presence of external magnetic field that serves as a source of assisting ions are optimized. It is shown that the working interval of the induction of external magnetic field corresponds to the resonant excitation of the coupled helicon and Trivelpiece–Gold waves. The effect of magnitude and configuration of magnetic field on the parameters of gas-discharge plasma and ion current in the substrate region is studied in the presence of separately and simultaneously initiated magnetron and inductive discharges. The effect of ion flux that is incident on the films in the course of growth on the structure of functional coatings is analyzed.
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