Abstract
It is proposed that the pursuit of optimal parameters for the synthesis of TiN thin films by reactive sputtering can be simplified by implementing plasma optical emission spectroscopy in real time. Emission from Ti and neutral and ionized species of Ar and N2 were obtained at different deposition conditions such as supplied power and gasses flow ratios. Thin films were characterized by X-ray photo-electron spectroscopy to determine their composition and the predominant component was found to be TiN; however, the larger N2/Ar flow ratio, the more oxygen inclusion in the films. Multivariate statistical analysis was performed to determine the relation between the film composition and plasma optical emission spectroscopy results.
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