Abstract
AbstractDue to its particular optical and mechanical properties, fused silica is one of the most relevant materials for the production of optical, opto‐mechanical and opto‐electrical components and systems. Since such glasses feature a high transmittance in the ultraviolet (UV) spectral range, deep UV‐laser irradiation or several hybrid methods are usually applied in laser‐based manufacturing of optically operative micro‐structures on fused silica substrates. Against this background, the development of novel methods for increasing the UV‐absorption temporarily is of great interest for laser scribing of optical gratings, micro optics and integrated optical systems. Here, cost‐ and energy‐efficient plasma treatment techniques at atmospheric pressure offer different approaches that can also be applied to other optical glasses.
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