Abstract

We present in situ. real-time monitoring of emission lines from rf induced plasma of elemental and ionized species from target of YBaCuO7_ compounds during the sputtering growth. Abundances of the ionized and/or neutral species rather than clusters were observed while relative composition of the species was varied by target composition, applied rf power, gas pressure, and location of substrate. We discuss usefulness of real time monitoring of ejected species which depend on rf power and gas pressure during the sputtering deposition of high Tc superconducting thin films.

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