Abstract
AbstractThe influence of the intentionally inhomogeneous plasma flow on the spatial distribution of the ITO optical properties has been investigated. The oscillator force has a minimum at low plasma flow and maxima at the high plasma flow regions of the sample. The free electron density increases at the edges of the wafer compared to the low plasma flow area of the sample. The changes are explained by varying the film microstructure and stoichiometry on macro‐ and microscopic scales. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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