Abstract
We study the morphologies and the field emission properties of carbon nanotube (CNT) arrays grown on silicon substrate before and after Ar and O 2 plasmas etching. The CNT arrays are synthesized by chemical vapor deposition of ethylene and argon gases in the presence of iron catalysts. Plasma etching is carried out in a DC magnetron-sputtering apparatus. After the treatment, a novel structure of needle-shaped bundles on the surface of CNT arrays is obtained, whose morphologies will be quite different under varied conditions. Enhanced field emission properties are observed after proper treatment.
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