Plasma display panel MgO thin film properties and their modification by low energy ion bombardment

Abstract

This paper contributes to a phenomenological understanding of the low energy ion bombardment induced changes of MgO thin films inside plasma display panels. SEM (scanning electron microscope) and optical photography are utilized to delineate local MgO changes such as densification and stress reversal at the operated gas panel cell site. MgO surface transformation is shown to be influenced by the presence of contaminants, surface topography, ion current and panel operating time. The implications of some of these with respect to panel operation are discussed. MgO thin film growth behaviour using electron-beam deposition and MgO film properties are dealt with in order to understand better the observed surface changes.