Abstract
Polytetrafluoroethylene-like coatings with a remarkably high amount of CF2 groups to the extent of 85% were deposited with a pulsed microwave discharge at low pressure. They were obtained by plasma enhanced chemical vapor deposition using solely octafluoropropane gas, C3F8, as precursor. The influence of gas pressure and microwave power on properties of the deposited coatings like content of CF2-chains, F/C-ratio, deposition rate, and wettability is described. Best results regarding a high difluoromethylene group content of the films were obtained at a pressure of 50 Pa at higher microwave powers. FTIR spectra show the two distinct absorption bands, which are assigned to the CF2 asymmetric and symmetric stretching modes, demonstrating convincingly the nature of the highly ordered PTFE-like films.
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