Abstract
AbstractWe report on the characterization of d.c. discharge plasma‐enhanced chemical vapour deposition of nanocarbon film materials in a hydrogen–methane gas mixture. The effects of the gas composition and pressure on the current–voltage characteristics and optical emission spectra of the discharge plasma are studied. By varying the parameters we obtain various carbon thin‐film materials, the structure and composition of which are characterized qualitatively by Raman spectroscopy and electron microscopy. The data obtained by optical emission spectroscopy show the presence of H, H2, CH and C2 activated species in the discharge plasma. We assume that C2 dimers play a decisive role in nanostructured graphite‐like carbon film formation and carbon condensation in the gas phase. Copyright © 2004 John Wiley & Sons, Ltd.
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