Abstract
The influence of a pressure of gas mixture (10 vol% O2 + 90% N2) on an average size of copper oxide nanoparticles, produced in the plasma of low pressure arc discharge, has been studied as a basic process variable. A correlation between the dependence of average particle size on gas mixture pressure and the dependence of discharge gap voltage on product of interelectrode distance by a gas mixture pressure, has been found. The estimation was carried out by means of X-ray diffraction (XRD) and high-resolution transmission electron microscopy (HRTEM). A mathematical model of the cathode region, which shows the applicability of the similarity theory to the low pressure arc discharge, has been represented.
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