Abstract
A novel rf plasma beam source operated with CH 4 and CH 4+H 2 mixtures is used for the formation of hydrogenated hard carbon layers. The film composition, particularly the H content, is determined by secondary neutral mass spectrometry (SNMS) and the binding structure by XPS utilizing the characteristic plasmon losses of the C(1s) photoelectrons. As demonstrated by the characteristic XPS structures, diamond-like films are obtained for plasma beam energies around 120 eV with the substrates being held at room temperature. The microhardness and the electrical resistance of the films compare with the best values reported in the literature.
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