Abstract
The application of ion plating technology to the deposition of optical thin films is examined using rf-plasma as an ion source in a conventional evaporation system. Experimental results are reported for the deposition of dielectric thin films Y 2O 3, Ta 2O 5, ZnSe, (BaF 2). Application of these films as special IR coatings in the range 8–14 μm are suggested. Adherence, refractive index, internal structure and losses have been tested. Structural characterization has been performed using SEM, and losses have been studied in integrated optical configuration.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
