Abstract
The application of ion plating technology to the deposition of optical thin films is examined using rf-plasma as an ion source in a conventional evaporation system. Experimental results are reported for the deposition of dielectric thin films Y 2O 3, Ta 2O 5, ZnSe, (BaF 2). Application of these films as special IR coatings in the range 8–14 μm are suggested. Adherence, refractive index, internal structure and losses have been tested. Structural characterization has been performed using SEM, and losses have been studied in integrated optical configuration.
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