Plasma assisted and manipulated deposition of thin film electrodes for micro batteries

Abstract

The properties of the thin film electrodes have been the main factors for the performances of lithium or lithium ion micro batteries, i.e. thin film batteries. In this paper, plasma assisted and manipulated techniques have been developed for the fabrication of polycrystalline thin film cathodes, and of amorphous/nano-crystalline thin film anodes. The thin film electrodes were deposited by magnetron sputtering under precisely controlled plasma conditions. The deposition apparatuses were designed to obtain the desired film properties by equipping a long anode-shield or an inductive coil. Polycrystalline LiMn 2O 4 thin film cathodes with a smooth surface were deposited, which greatly reduced the cathode/electrolyte interface resistances. Amorphous/nano-crystalline Sn thin film anodes were obtained free of plasma induced large grains, which enhanced the cycling stability. The results have demonstrated that by careful designs of deposition apparatus the plasma conditions can be precisely controlled and therefore the thin film electrodes of desired properties can be obtained.