Abstract
The experiments described in this work were performed with the aim of introducing a new plasma antenna that was excited by a 5–20 kHz alternating current (AC) power supply, where the antenna was transformed into a U-shape. The results show that the impedance, voltage standing-wave ratio (VSWR), radiation pattern and gain characteristics of the antenna can be controlled rapidly by varying not only the discharge power, but also by varying the discharge frequency in the range from 5 to 20 kHz. When the discharge frequency is adjusted from 10 to 12 kHz, the gain is higher within a relatively broad frequency band and the switch-on time is less than 1 ms when the discharge power is less than 5 W, meaning that the plasma antenna can be turned on and off rapidly.
Highlights
Plasma antennas have attracted considerable research attention in recent years because they offer numerous distinct advantages over conventional metal antennas.[1,2,3,4] The parameters of these antennas can be reconfigured conveniently by changing the discharge power, which makes it possible to use the antennas over a wide waveband and enables simplification of the matching network
The experiments described in this work were performed with the aim of introducing a new plasma antenna that was excited by a 5–20 kHz alternating current (AC) power supply, where the antenna was transformed into a U-shape
The results show that the impedance, voltage standing-wave ratio (VSWR), radiation pattern and gain characteristics of the antenna can be controlled rapidly by varying the discharge power, and by varying the discharge frequency in the range from 5 to 20 kHz
Summary
Plasma antennas have attracted considerable research attention in recent years because they offer numerous distinct advantages over conventional metal antennas.[1,2,3,4] The parameters of these antennas can be reconfigured conveniently by changing the discharge power, which makes it possible to use the antennas over a wide waveband and enables simplification of the matching network. Over the past few decades, 50 or 60 Hz AC power supplies were used to produce the plasmas, these power supplies were found to produce very high levels of noise.[3] For the vast majority of plasma antennas, the plasma is produced using high frequency (≥ 1 MHz, HF) power supplies. These antennas are usually called RF plasma antennas or surface wave plasma antennas, and have been shown to maintain a specific gain and low noise.[18] the bandwidths of such antennas for the pumping frequency are limited, and the cost of the pumping RF generator is high. We can change the discharge power, but can vary the discharge frequencies to alter the characteristics of the plasma antenna
Sign-in/Register to view highlights & summary Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
