Abstract

Positrons (i.e., antielectrons) find use in a wide variety of applications, and antiprotons are required for the formation and study of antihydrogen. Available sources of these antiparticles are relatively weak. To optimize their use, most applications require that the antiparticles be accumulated into carefully prepared plasmas. We present an overview of the techniques that have been developed to efficiently accumulate low energy antiparticles and create, in particular, tailored antiparticle plasmas. Techniques are also described to create tailored antiparticle beams. Many of these techniques are based on methods first developed by the nonneutral plasma community using electron plasmas for increased data rate. They have enabled the creation and trapping of antihydrogen, have been critical to studies of positron and positronium interactions with matter, including advanced techniques to characterize materials and material surfaces, and have led to the creation and study of the positronium molecule. Rather than attempting to be comprehensive, we focus on techniques that have proven most useful, applications where there has been significant, recent progress, and areas that hold promise for future advances. Examples of the latter include the ever more precise comparisons of the properties of antihydrogen and hydrogen, tests of gravity using antihydrogen and positronium atoms, and efforts to create and study phases of the many-electron, many-positron system.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.