Abstract
In the present study mass spectrometric measurements were carried out on the ion flux to the substrate during the a-C:H deposition process by ion plating and r.f. glow discharge. For this purpose a portion of ion flux striking the substrate was passed through an aperture into a differentially pumped chamber, in which the energy distribution of the ions is measured by an electrostatic analyser and the e/m value by a quadrupole mass spectrometer. The discharge conditions were measured with a Langmuir probe. Depending on the discharge conditions and the hydrocarbon gas used, typical ion groups are observed. These ion groups are generated by electron impact or ion-molecule reactions.
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