Abstract
Diamond films, deposited on silicon substrates through microwave-assisted chemical vapor deposition, have been polished with a 500-eV beam of oxygen ions through the use of a planarizing layer. The films' surface roughness, in excess of 1 microm (rms) and 6 microm (peak to valley), was reduced to 35 nm (rms) and 217 nm (peak to valley). The polished films retained their diamond character and surface contamination was negligible. With this polishing process, optical applications of diamond films in the near infrared region are realizable.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
