Abstract
The parameters of planar and channel waveguide lasers fabricated by different techniques are reviewed. Materials and properties of thin films used for creation of planar waveguide lasers are summarized. The parameters of active and passive planar waveguides created by the method of pulsed laser deposition and problems of laser deposition are described. The aspects of laser generation of planar waveguide lasers, resonators and channel waveguides are presented. The results of our experiments of laser deposition of thin Ti:sapphire layers and thin layers of Nd:YAG and Nd:YAP are briefly discussed.
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