Abstract
A new type of ion diode named the ‘‘Planar-Type Self-Magnetically-Insulated Diode’’ is developed. Good efficiency of ion production (∼30%) is obtained with good reproducibility. A multiple-shot operation (40 shots or even more) is possible with relatively high power (900 kV, 180 kA). Surface flashover of the anode is affected by an initial irradiation of lower-energy electrons of the incident voltage pulse.
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