Abstract
Highly efficient laser action is demonstrated in epitaxially grown Nd:GGG and Ti:sapphire layers. Waveguide losses as low as 0.5 dB/cm are achieved in films of low particulate content, high homogeneity and improved surface morphology obtained by optimized pulsed laser deposition (PLD) configurations. Low threshold laser emission is observed at 800 nm for Ti:sapphire, and at 1060 nm and 937 nm for Nd:GGG waveguides, with slope efficiencies of 26% and 20% respectively. These results verify the versatility of PLD schemes in the fabrication of novel optoelectronic structures.
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