Planar Hall effect in electrodeposited CoCu/Cu multilayer

Abstract

Electrodeposited CoCu/Cu multilayers were investigated by measuring both anisotropic magnetoresistance (AMR) and planar Hall effect (PHE) simultaneously. Studies have been carried out on a [Co(3 nm)/Cu(4 nm)]50 multilayer sample, where a maximum of −8.8 % GMR was observed at room temperature. A direct comparison of AMR and PHE output has been made both as a function of field and its relative orientation with respect to the current. Marked changes in PHE loops were observed at different angles (between magnetic field and applied current) whereas no noticeable changes could be found for AMR results. Such PHE outputs are the manifestations of complex spin reorganization due to strong antiferromagnetic-coupling between adjacent magnetic layers. In case of angular dependence output, when the applied field is less than the coercive field, the PHE output shows a deviation from the Sin2θ dependence that can be correlated to the domain wall propagation.