Abstract

Pitting Corrosion on Diamond-like Carbon Films to High Concentration Sodium Hydroxide Solution

Highlights

  • Diamond-like carbon (DLC) films are hydrogenated amorphous carbon (a-C:H) films; they have been applied to mechanical parts owing to their high hardness and low friction coefficient.[1,2,3] These films consist of carbon and hydrogen atoms; the carbon atoms are mainly sp2- or sp3hybridized

  • To indicate the film structure, a tertiary diagram consisting of the content sp2 and sp3 carbon atoms and hydrogen atoms was proposed by Robertson.[4,5,6] The relationships between the film properties and the structure of DLC films have often been discussed using this tertiary diagram

  • After 12 h, some pores were observed at some sites on the sample deposited on Si[100], no changes were noted on the DLC film deposited on PTFE

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Summary

Introduction

Diamond-like carbon (DLC) films are hydrogenated amorphous carbon (a-C:H) films; they have been applied to mechanical parts owing to their high hardness and low friction coefficient.[1,2,3] These films consist of carbon and hydrogen atoms; the carbon atoms are mainly sp2- or sp3hybridized.Due to the structural flexibility of sp2- and sp3-hybridized carbon atoms, these films are all referred to as “DLC” their properties depend on the arrangement of the sp2- and sp3hybridized carbon atoms. Diamond-like carbon (DLC) films are hydrogenated amorphous carbon (a-C:H) films; they have been applied to mechanical parts owing to their high hardness and low friction coefficient.[1,2,3] These films consist of carbon and hydrogen atoms; the carbon atoms are mainly sp2- or sp3hybridized. To indicate the film structure, a tertiary diagram consisting of the content sp and sp carbon atoms and hydrogen atoms was proposed by Robertson.[4,5,6] The relationships between the film properties and the structure of DLC films have often been discussed using this tertiary diagram. The relationship between the resistance and film structure of DLC films against some chemicals has been reported.[7,8,9] Some reports indicate that the rate of film thickness change is very slow, such as sub-nanometers per hour. Sasaki et al reported the etching rate of an a-C:H film by nitric acid solution using the surface plasmon resonance (SPR).(10) The chemical resistance of an a-C:H film can be quantitatively estimated using their method, and the ISSN 0914-4935 © MYU K.K.

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