Abstract
We constructed an HD DVD mastering process simulator on the basis of the cell removal model. In the exposure process, we simulated the exposure profile in the photoresist film. In the development process, we defined the density and development rate of the unit cell. We carried out iterative calculation for each unit cell dissolution. The development rate was approximated as the function of the exposure intensity profile. From the results, we were able to simulate the three-dimension (3D) pit profiles of HD DVD-ROM (read only memory). We clarified that our development rate equation is similar to Hirai et al. and Trefonas and Daniels' type equation in semiconductor lithography.
Published Version
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