Abstract
We demonstrate the successful chemical vapor deposition of pinhole-free extremely thin (10–50nm) nanocrystalline diamond (NCD) films to examine the potential of electrostatic self-assembly seeding with increased salt concentration of nanodiamond colloids as a nucleation enhancement step. The deposited films are characterized by scanning electron microscopy (SEM) and Raman spectroscopy to evaluate their surface morphologies and crystalline qualities. To carefully detect pinholes which are invisible via SEM, linear sweep voltammetry and cyclic voltammetry are also performed on the NCD film surfaces using the electrochemical oxidation of underlying silicon substrates. These investigations reveal that ~30nm thick continuous NCD films are successfully obtained and completely pinhole-free ~50nm thick films are reliably accessible via the proposed seeding technique.
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