Abstract
Pinhole defects of TiN films deposited onto stainless steel by a few dry coating processes were evaluated potentiodynamically in a deaerated 0.5 kmol/m 3 H 2SO 4+0.05 kmol/m 3 KSCN solution at 298 K. The critical passivation current density i crit in the TiN films prepared by activated reactive evaporation method decreased considerably with increasing film thickness. For the ⩾1.5 μm thick films prepared by r.f. reactive sputtering, and ion mixing and vapor deposition methods; however, there was an increasing tendency in i crit with cracking and/or peeling. Here, the area ratio of pinhole defects was evaluated by the ratio of i crit of a coated and a non-coated specimen. Such electrochemical evaluation was concluded to be a reliable technique for the pinhole defects of dry coating films.
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