Abstract
A novel pigment dispersed resist system (red, green and blue), which consists of a crosslinkable acrylate copolymer, a photoinitiator, and selected pigment dispersions has been developed. The materials combine excellent resistance to solvents, acids and alkalis, good thermal stability, light fastness, high transparency, chromaticity, contrast and film uniformity with adequate sensitivity (200mJ/cm2), high resolution (≤_10μm) and large process margins. As the photospeed of conventional acrylate-based photopolymerizable resist systems is deteriorated in air due to oxygen induced inhibition reactions, the acrylate group was directly attached to the polymer, yielding high sensitivity even in the presence of oxygen. The application of a proprietary surfactant containing developer eliminated the formation of pigment residues after development.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.