Abstract
A novel pigment dispersed resist system (red, green and blue), which consists of a crosslinkable acrylate copolymer, a photoinitiator, and selected pigment dispersions has been developed. The materials combine excellent resistance to solvents, acids and alkalis, good thermal stability, light fastness, high transparency, chromaticity, contrast and film uniformity with adequate sensitivity (200mJ/cm2), high resolution (≤_10μm) and large process margins. As the photospeed of conventional acrylate-based photopolymerizable resist systems is deteriorated in air due to oxygen induced inhibition reactions, the acrylate group was directly attached to the polymer, yielding high sensitivity even in the presence of oxygen. The application of a proprietary surfactant containing developer eliminated the formation of pigment residues after development.
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