Abstract
The stress-related change in the characteristics of transistors manufactured in the 22 nm fully depleted silicon on insulator (FDSOI) CMOS technology node is studied with advanced experimental indentation setups. Precisely, NAND and NOR ring oscillator circuits are used to monitor the strain-caused mobility deviations in the silicon transistor channels. Piezoresistive coefficients for strained silicon are calculated from the experimental indentations data using spherical and cylindrical tip geometries. In contrast to spherical tips, the cylindrical indentation tips enable to induce the stress more selectively into a desired direction. To set up the experimental details appropriately, finite element (FE) simulations have been used. Additionally, FE method (FEM) studies are conducted to compute the quantitative strain values in the silicon transistor channels as a function of contact load as well as chip and tip geometries. Using the signal deviations of the RO circuits subjected to strain from spherical and cylindrical indentation, a set of equations using the linearized piezoresistive model are created to determine the directional piezoresistive coefficients.
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