Abstract
A p-type single crystal silicon nanowire bridge and a four-terminal nanowire element were fabricated by electron-beam direct writing. The piezoresistance was investigated in order to demonstrate the usefulness of these sensing elements as mechanical sensors. The longitudinal piezoresistance coefficient πl[110] was found to be 38.7×10−11 Pa−1 at a surface impurity concentration of Ns=9×1019 cm−3 for the nanowire bridge. The shear piezoresistance coefficient π44 was found to be 77.4×10−11 Pa−1 at Ns=9×1019 cm−3 for the four-terminal nanowire element. These values are 54.8% larger than the values obtained from p+ diffused piezoresistors, which are used in conventional mechanical sensors.
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