Physical-chemical properties of silicon carbonitride films prepared using laser-plasma deposition from hexamethyldisilazane

Abstract

A new method of the plasma chemical vapor deposition with the activation of the initial compounds by the plasma of the CO2 laser in the high-speed gas flow has been applied for the synthesis of silicon carbonitride SiCN films on a substrate of stainless steel and instrumental alloys using hexamethyldisilazane vapors. The preparation of the coatings of the laser-plasma deposition in the variants of the chamber and non-chamber deposition has been studied. The properties of the prepared coatings have been studied by the methods of IR and Raman spectroscopy, atomic-force microscopy, and XRD-analysis analysis. The studies of the structure of the films using diffraction synchrotron radiation showed that the prepared silicon carbonitride coatings are X-ray amorphous. The ratio of the Si-C/Si-N bonds in coatings increases with the increase in the substrate temperature. The microhardness of the prepared coatings on stainless steel substrates is 15–25 GPa.