Abstract
The brief analytical review of literary data concerning the processes which are a physical basis of vacuum-arc coating deposition technology is presented. The phenomena responsible for formation of films by condensation of substance from plasma of arc discharge in vacuum or in a gaseous ambience of low pressure are described.. Interaction of metal plasma with a gas target, a substrate and other surfaces of working chamber, the processes of nucleation and condensate growth, influence of energetic parameters of a deposition process (kinetic and potential energy of metal ions, activation degree and sort of the gas ) on properties of condensates and near-surface layers of the substrate are described.
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