Physical and mechanical properties of the TixZr1−хN thin films

Abstract

In this article, how the behaviour of the physical and mechanical properties of the phase composition, elemental composition and microstructure of TiхZr1−хN thin films changes under the influence of the deposition process was studied. The technological parameters and temperature of the deposition process were determined and specified by various ion-plasma methods. It was revealed that the TiхZr1−хN thin film with a volume content of the quaternary TiZrN2 phase of ⩾78% and a zirconium level of more than 30at.% has the optimal combination of physical and mechanical properties: Н=36GPа, Е=200GPa, We=78%, H/E∗=0.18 and H3/E∗2=1.1GPa if carried out by cathodic arc evaporation (CAE) at the thin film’s intake temperature Tf=725K with a heating rate during the deposition process of Vfilm=3.7K/min.