Physical and electrochemical area determination of electrodeposited Ni, Co, and NiCo thin films

Matthew J Gira,Kevin P Tkacz,Jennifer R Hampton

doi:10.1186/s40580-015-0055-5

Abstract

Physical and electrochemical area determination of electrodeposited Ni, Co, and NiCo thin films

Highlights

Nanoporous materials are of increasing scientific and technological interest due to a variety of useful properties such as low mass density, high surface area, high strength, and enhanced optical, electrical, thermal, and catalytic behavior
Afterwards, the roughness factor, RF, was calculated as RF = AAFM/Aproj, where AAFM is the surface area calculated from the image using the Nanoscope Analysis software and Aproj is the (b) Co (c) NiCo
4 Conclusions For the metal thin films studied here, the results indicate that in situ electrochemical measurements of doublelayer capacitance are correlated with the roughness factors extracted from ex situ topographic atomic force microscopy (AFM) images

Summary

Introduction

Nanoporous materials are of increasing scientific and technological interest due to a variety of useful properties such as low mass density, high surface area, high strength, and enhanced optical, electrical, thermal, and catalytic behavior. Potential applications of metals with nanoporous morphology include batteries, capacitors, magnetic storage media, lightweight structures, sensors, and water filtration devices [1]. The enhanced surface area and size-dependent reactivity of nanoporous metals make them a promising area of study for a number of catalytic applications. An important factor in evaluating the reactivity of a porous metal is the surface area available for reaction. Both increased surface area and changes in intrinsic reactivity can have significant effects on the overall behavior of a target material. Straightforward and practical area measurement procedures are an essential aspect of catalysis research

Objectives

Methods

Results

Conclusion